Samsung Completes Improvement of 5nm EUV Course of Know-how

Samsung Foundry introduced this week that the event of the first-generation 5-nm manufacturing course of (beforehand 5LPE) has been accomplished. The manufacturing expertise makes use of excessive ultraviolet lithography (EUVL) and affords important benefits by way of efficiency, efficiency and space in comparison with the 7 nm course of from Samsung (7LPP). In the meantime, Samsung emphasizes that IP developed for 7LPP will also be used for chips made with 5LPE.

5LPE is prepared (for sampling)

Samsung's 5nm expertise continues to make use of FinFET transistors, however with a brand new commonplace cell structure and a mixture of DUV and EUV step-and-scan programs. In comparison with 7LPP, Samsung claims that the 5LPE manufacturing course of allows chip designers to scale back energy consumption by 20% or enhance efficiency by 10%. As well as, the corporate guarantees to extend logical area effectivity by as much as 25%.

PPA enhancements for brand spanking new course of applied sciences
Information disclosed by corporations by way of phone conferences, press conferences and press releases

14 LPP
in opposition to 28 LPP
10LPE
in opposition to 14LPE
10LPE
in opposition to 14LPP
10 LPP
in opposition to 10LPE
10 LPU
vs
10LPE
7LPP
in opposition to 10LPE
5LPE
vs
7LPP

energy
60%
40%
30%
~ 15%
?
50%
20%

efficiency
40%
27%
> 10%
~ 10%
?
20%
10%

discount in space
50%
30%
30%
none
?
40%
<20%

Semiconductor vendor says it may reuse all of 7LPP's present mental property on chips developed for 5LPE expertise, lowering buyer migration prices and shortening the product growth cycle. As a rule, IP suppliers are likely to optimize and confirm their IP for brand spanking new course of nodes. So it stays to be seen whether or not reusing 7LPP IP blocks for 5LPE chips is the optimum resolution.

Samsung Foundry mentioned it has supplied its prospects the 5LPE Course of Design Package (PDK), Design Methodologies (DM), Digital Design Automation (EDA) applications, and IP for the reason that fourth quarter of 2018. As well as, the corporate has began providing its prospects the 5LPE Multi Mission Wafer (MPW) shuttle service. General, the expertise is prepared for design launches and sampling, taking into consideration that danger manufacturing and mass manufacturing, as is frequent in such bulletins, continues to be a bit distant.

"Following the profitable completion of our 5nm growth, now we have demonstrated our capabilities in EUV-based nodes," mentioned Charlie Bae, govt vice chairman of Foundry Enterprise at Samsung Electronics. "Given the assorted advantages, together with PPA and IP, Samsung's EUV-based Superior Nodes are anticipated to be in sturdy demand for brand spanking new and progressive purposes comparable to 5G, AI, Excessive Efficiency Computing (HPC) and automotive."

gif;base64,R0lGODlhAQABAAAAACH5BAEKAAEALAAAAAABAAEAAAICTAEAOw== - Samsung Completes Improvement of 5nm EUV Course of Know-how

EUV at Samsung

Along with asserting its 5nm course of expertise, Samsung Foundry has shared some particulars this week about ramping up its 7LPP manufacturing with EUVL instruments. Because it turned out, the corporate had offered business samples of 7LPP chips to events and began mass manufacturing of chosen designs earlier this yr.

Samsung Foundry Lithography Roadmap, HVM Launch
Information disclosed by the corporate by way of phone conferences, press conferences and press releases

2017
2018
2019
2020
2021
2022
2022+

1H
2H
1H
2H
1H
2H
1H
2H

10LPE
10 LPP
eight LPP
10LPU *
7LPP
5LPE **
5LPE
4LPE *
four LPP *
3GAAE *
3GAAP *

* Correct timing not introduced
** Can solely be out there for Samsung LSI

Samsung experiences that it’s presently utilizing Twinscan NXE: ASML 3400B EUVL scanners to provide 7LPP chips at Fab S3 in Hwaseong, South Korea. The corporate is nicely on the best way to finishing its devoted EUV line at Hwaseong within the second half of 2019 and to start mass manufacturing there in 2020.

Bibliography:

Supply: Samsung Foundry

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